Characterization of low-pressure microwave and radio frequency discharges in oxygen applying optical emission spectroscopy and multipole resonance probe

Simon Steves, Tim Styrnoll, Felix Mitschker, Stefan Bienholz, Nikita Bibinov, Peter Awakowicz

JOURNAL OF PHYSICS D-APPLIED PHYSICS, Volume: 46, Issue: 44, Article Number: 445201, DOI: 10.1088/0022-3727/46/44/445201, Published: NOV 6 2013


Abstract

Optical emission spectroscopy (OES) and multipole resonance probe (MRP) are adopted to characterize low-pressure microwave (MW) and radio frequency (RF) discharges in oxygen. In this context, both discharges are usually applied for the deposition of permeation barrier SiO x films on plastic foils or the inner surface of plastic bottles. For technological reasons the MW excitation is modulated and a continuous wave (cw) RF bias is used. The RF voltage produces a stationary low-density plasma, whereas the high-density MW discharge is pulsed. For the optimization of deposition process and the quality of the deposited barrier films, plasma conditions are characterized using OES and MRP. To simplify the comparison of applied diagnostics, both MW and RF discharges are studied separately in cw mode. The OES and MRP diagnostic methods complement each other and provide reliable information about electron density and electron temperature. In the MW case, electron density amounts to n(e) = (1.25 x 0.26) x 10(17) m(-3), and kT(e) to 1.93 +/- 0.20 eV, in the RF case n(e) = (6.8 x 1.8) x 10(15) m(-3) and kT(e) = 2.6 +/- 0.35 eV. The corresponding gas temperatures are 760 +/- 40K and 440 +/- 20 K.

Tags: plasma