Plasma Diagnostics in Dielectric Deposition Processes

Christian Schulz, Ilona Rolfes

IEEE Sensors 2016, pp. 1-3, DOI: 10.1109/ICSENS.2016.7808810 Orlando, Florida, USA, Oct 30-Nov 2, 2016


This contribution presents an in-situ plasma probe, which is capable to measure precisely in the challenging environment of deposition processes. The probe is inserted into the plasma in order to determine critical parameters, which are required for a process control. Therefore, the effects of deposited dielectric materials, which adsorb onto the probe, are investigated within numerous pseudo deposition processes by 3D electromagnetic field simulations. Here, the adsorbed material is varied in its relative permittivity and layer thickness for two different loss tangents. The corresponding evaluations demonstrate the suitability and the prospects of the probe within these simulations. The final measurements in an argon-oxygen plasma, depositing TiO2, confirm the insensitivity of the probe.

[IEEE Library]

Tags: diagnostics, plasma