The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma

Deborah O'Connell, Egmont Semmler, Peter Awakowicz

Appl. Phys. Lett. 93 (2008)


Abstract

Frequency coupling in multifrequency discharges is a complex nonlinear interaction of the different frequency components. An alpha-mode low pressure rf capacitively coupled plasma operated simultaneously with two frequencies is investigated and the coupling of the two frequencies is observed to greatly influence the excitation and ionization within the discharge. Through this, plasma production and sustainment are dictated by the corresponding electron dynamics and can be manipulated through the dual-frequency sheath. These mechanisms are influenced by the relative voltage and also the relative phase of the two frequencies.

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